Optimization of electron beam lithography on oxide heterostructures

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Optimization of electron beam lithography on oxide heterostructures

Type: Master thesis
Title: Optimization of electron beam lithography on oxide heterostructures
Author: Piñeiros Bastidas, Jessika Maribel
Issue Date: 2018-08-30
Keywords: e- beam lithography
oxide heterostructures
Hall bars
Abstract: In this thesis we are interested in growing LaAlO3 films onto SrTiO3 substrates with an off-axis geometry radio frequency magnetron sputtering technique in order to study the properties of the Q2DES found at the interface between this two band insulators. Hall bars with an Al2O3 hard mask were patterned onto TiO2-terminated SrTiO3 substrates. The selected lithographic process was electron beam lithography due to its high resolution. With respect to the growing of the Al2O3 hard mask two different approaches were used.
Supervisor: Aarts, Jan
Faculty: Faculty of Science
Department: Physics (Master)
Specialisation: Quantum Matter & Optics
ECTS Credits: 3
Handle: http://hdl.handle.net/1887/63092
 

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